发明名称 Methods Of Patterning Materials
摘要 Some embodiments include methods of forming openings. For instance, a construction may have a material over a plurality of electrically conductive lines. A plurality of annular features may be formed over the material, with the annular features crossing the lines. A patterned mask may be formed over the annular features, with the patterned mask leaving segments of the annular features exposed through a window in the patterned mask. The exposed segments of the annular features may define a plurality of openings, and such openings may be transferred into the material to form openings extending to the electrically conductive lines.
申请公布号 US2012244708(A1) 申请公布日期 2012.09.27
申请号 US201213491466 申请日期 2012.06.07
申请人 SIPANI VISHAL;ZHOU BAOSUO;YANG MING-CHUAN;MICRON TECHNOLOGY, INC. 发明人 SIPANI VISHAL;ZHOU BAOSUO;YANG MING-CHUAN
分类号 H01L21/302 主分类号 H01L21/302
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