发明名称 IMPRINT LITHOGRAPHY TEMPLATE, METHOD OF FABRICATING AN IMPRINT LITHOGRAPHY TEMPLATE, AND METHOD OF FORMING A PATTERN
摘要 According to one embodiment, an imprint-lithography template comprises: a second substrate; a first photo-curable resin provided on a main surface of the first substrate and having a first concave-convex pattern; and a second photo-curable resin provided on the main surface of the first substrate, having a second concave-convex pattern different in pattern density from the first concave-convex pattern, and having optical transmittance different from that of the first photo-curable resin.
申请公布号 US2012244243(A1) 申请公布日期 2012.09.27
申请号 US201213428187 申请日期 2012.03.23
申请人 KOBAYASHI YOSHIHITO 发明人 KOBAYASHI YOSHIHITO
分类号 B28B11/08;B29C59/00;B29C59/16 主分类号 B28B11/08
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