| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a method that can achieve a pattern having a dimension almost equal to a design value by compensating the contraction of resin, in the design of a nano-printing mold. <P>SOLUTION: In the design of the mold for nano-printing having a plurality of irregular patterns which are aligned at equal intervals, and transferring the patterns to a film 2 formed of a flexible material by press work, when the pattern of a protrusion 22 formed on the surface of the film 2 is a rectangular parallelepiped having a line width w<SB POS="POST">1</SB>, a height h<SB POS="POST">1</SB>and a length L<SB POS="POST">1</SB>, a line width of a recess 31 of the mold 3 corresponding to the protrusion 22 is set as a line width w<SB POS="POST">3</SB>which is calculated by using the following formula (1). Here, p(w) is a prediction factor expressed by a block factor of a general space frequency. <P>COPYRIGHT: (C)2012,JPO&INPIT |
