| 摘要 |
A lithography apparatus comprises a structural element, a sensor (220) having a detection region (225) for detecting a physical quantity in at least one detection direction with respect to the structural element, and a sensor receptacle (210) for mounting the sensor (220) to the structural element, wherein the sensor (220) is arranged in such a way that the maximum displacement of the detection region (225, 255) in the detection direction relative to the structural element (140) is not greater than the maximum displacement of the detection region (225, 255) in the detection direction in the case of an arrangement of the sensor (220, 250) orthogonally with respect thereto. |
