摘要 |
A power semiconductor device includes a first semiconductor layer of a first conduction type, a second semiconductor layer of the first conduction type, a third semiconductor layer of a second conduction type, a fourth semiconductor layer of the first conduction type, a gate insulating film, a gate electrode, an interlayer insulating film, a fifth semiconductor layer of the second conduction type, a sixth semiconductor layer of the second conduction type, an insulative current narrowing body, a first electrode, and a second electrode. The sixth semiconductor layer of the second conduction type contains a second conduction type impurity in a concentration higher than a second conduction type impurity concentration of the fifth semiconductor layer. The insulative current narrowing body is provided in the fifth semiconductor layer. The insulative current narrowing body has a surface parallel to the surface of the fifth semiconductor layer and a space provided in the surface. |