| 发明名称 |
CLEANING SOLUTION FOR SIDEWALL POLYMER OF DAMASCENE PROCESSES |
| 摘要 |
<p>An aqueous cleaning solution and a method of use of the cleaning solution are described herein for removing sidewall polymer of a damascene process on a wafer without damaging any low-k material and interconnect material on the wafer.</p> |
| 申请公布号 |
SG183510(A1) |
申请公布日期 |
2012.09.27 |
| 申请号 |
SG20120063467 |
申请日期 |
2011.03.01 |
| 申请人 |
LAM RESEARCH CORPORATION |
发明人 |
OZZELLO, ANTHONY D., JR.;CHUANG, KEVIN |
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