| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a semiconductor manufacturing apparatus which inhibits powder particles from occurring when cleaning inside a vertical reaction furnace by using a cleaning gas or during deposition. <P>SOLUTION: According to an embodiment, a semiconductor manufacturing apparatus comprises: a vertically movable rotation structure including a lower connection part 5 fixed to a rotation axis of a motor 6, an upper connection part 4 fixed on the lower connection part 5 and a boat 2 fixed on the upper connection part 4 for supporting a processing target substrate 10; and a reaction tube 1 forming a reaction chamber housing the rotation structure. The upper connection part 4 is composed of a material having a coefficient of thermal expansion between a coefficient of thermal expansion of the lower connection part 5 and a coefficient of thermal expansion of the boat 2. The upper connection part 4 is coated with a coating film having corrosion resistance against a cleaning gas and a reaction gas used in the processing chamber. <P>COPYRIGHT: (C)2012,JPO&INPIT |
