发明名称 PLATING FILM, ELECTRONIC PART, PLATING LIQUID, AND METHOD FOR FORMING PLATING FILM
摘要 <P>PROBLEM TO BE SOLVED: To provide a plating film having a high hardness and a low resistance, an electronic part having the plating film as an electric contact, a plating liquid capable of forming the plating film, and a method for forming the plating film. <P>SOLUTION: The plating film 10 comprises Au<SB POS="POST">(100-x-y)</SB>-M<SB POS="POST">x</SB>-C<SB POS="POST">y</SB>, wherein M is a metal element other than Au; and x and y satisfy the relations: 1&le;x&le;22, 3&le;y&le;30 and 4&le;(x+y)&le;40. The plating liquid 50 contains Au ions, Ni ions, citrate (Cit) ions and CN ions. <P>COPYRIGHT: (C)2012,JPO&INPIT
申请公布号 JP2012184468(A) 申请公布日期 2012.09.27
申请号 JP20110047860 申请日期 2011.03.04
申请人 WASEDA UNIV;OKUNO CHEMICAL INDUSTRIES CO LTD 发明人 AISAKA TETSUYA;OKINAKA YUTAKA;YOKOSHIMA TOKIHIKO;SUGIYAMA ATSUSHI
分类号 C25D7/00;C25D3/62;C25D5/18 主分类号 C25D7/00
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