发明名称 |
PLATING FILM, ELECTRONIC PART, PLATING LIQUID, AND METHOD FOR FORMING PLATING FILM |
摘要 |
<P>PROBLEM TO BE SOLVED: To provide a plating film having a high hardness and a low resistance, an electronic part having the plating film as an electric contact, a plating liquid capable of forming the plating film, and a method for forming the plating film. <P>SOLUTION: The plating film 10 comprises Au<SB POS="POST">(100-x-y)</SB>-M<SB POS="POST">x</SB>-C<SB POS="POST">y</SB>, wherein M is a metal element other than Au; and x and y satisfy the relations: 1≤x≤22, 3≤y≤30 and 4≤(x+y)≤40. The plating liquid 50 contains Au ions, Ni ions, citrate (Cit) ions and CN ions. <P>COPYRIGHT: (C)2012,JPO&INPIT |
申请公布号 |
JP2012184468(A) |
申请公布日期 |
2012.09.27 |
申请号 |
JP20110047860 |
申请日期 |
2011.03.04 |
申请人 |
WASEDA UNIV;OKUNO CHEMICAL INDUSTRIES CO LTD |
发明人 |
AISAKA TETSUYA;OKINAKA YUTAKA;YOKOSHIMA TOKIHIKO;SUGIYAMA ATSUSHI |
分类号 |
C25D7/00;C25D3/62;C25D5/18 |
主分类号 |
C25D7/00 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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