发明名称 |
APPARATUS FOR DEPOSITING THIN FILM COATINGS AND METHOD OF DEPOSITION UTILIZING SUCH APPARATUS |
摘要 |
The invention relates to an apparatus for depositing thin film coatings on a substrate. The deposition apparatus is designed to keep gaseous reactant materials to be deposited apart from one another in the deposition apparatus, by one or more separation devices and/or methods, but nevertheless, to allow the chemical reactants to mix and react at or near the substrate surface, rapidly enough to create a uniform film at commercially viable deposition rates. |
申请公布号 |
US2012240627(A1) |
申请公布日期 |
2012.09.27 |
申请号 |
US201213426697 |
申请日期 |
2012.03.22 |
申请人 |
NELSON DOUGLAS M.;WILLIAMS IAN R.;SOUBEYRAND MICHEL J.;STRICKLER DAVID A.;SANDERSON KEVIN D.;SETO YASUNORI;TSURI KEIKO;PILKINGTON GROUP LIMITED |
发明人 |
NELSON DOUGLAS M.;WILLIAMS IAN R.;SOUBEYRAND MICHEL J.;STRICKLER DAVID A.;SANDERSON KEVIN D.;SETO YASUNORI;TSURI KEIKO |
分类号 |
C03C17/245;C23C16/455 |
主分类号 |
C03C17/245 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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