GAS BARRIER FILM, AND METHOD FOR MANUFACTURING THE SAME

摘要

PROBLEM TO BE SOLVED: To provide a gas barrier film in which the adhesiveness between a substrate and a deposited thin film is improved with good productivity by using a plasma process in the same winding system as a vapor deposition process.

SOLUTION: The method for producing a gas barrier film includes the following steps: a step of subjecting one surface of a plastic material that is a substrate 11 to a plasma process with a low-temperature plasma generated by applying alternating current within a range between 10 kHs and 1 MHz under a pressure of 1-50 Pa using an inert gas in a plasma etching process of ion collision with a substrate disposed adjacent to a cathode; a step of depositing process of depositing an inorganic material on the surface subjected to the plasma processing; and a step of coating a protective layer 14 on the deposited thin film 13.

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