| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a mask inspection method that can reduce the inspection time and labor, and to provide a device employing the method. <P>SOLUTION: According to one embodiment, a mask inspection method uses an optical system that obtains an image with an imaging unit by making a light having an arbitrary wavelength incident to a mask for exposing semiconductor in order to inspect existence of defects on the mask. The mask inspection method comprises: a first step (S203) for obtaining control conditions for elongating in advance a point image obtained at the optical system in the reading direction of the imaging unit; a second step (S205) for obtaining an image at a desired area of the mask according to the control conditions; and a third step (S206) where, if a peak signal exists, in which the signal strength of the image at the desired area of the mask is equal to or above a predetermined first threshold and the difference in the signal strength in the reading direction is equal to or below a predetermined second threshold, the coordinates of the peak signal are detected as defects. <P>COPYRIGHT: (C)2012,JPO&INPIT |
