发明名称 P-/METAL FLOATING GATE NON-VOLATILE STORAGE ELEMENT
摘要 Non-volatile storage elements having a P−/metal floating gate are disclosed herein. The floating gate may have a P− region near the tunnel oxide, and may have a metal region near the control gate. A P− region near the tunnel oxide helps provide good data retention. A metal region near the control gate helps to achieve a good coupling ratio between the control gate and floating gate. Therefore, programming of non-volatile storage elements is efficient. Also, erasing the non-volatile storage elements may be efficient. In some embodiments, having a P− region near the tunnel oxide (as opposed to a strongly doped p-type semiconductor) may improve erase efficiency relative to P+.
申请公布号 US2012243337(A1) 申请公布日期 2012.09.27
申请号 US201113153964 申请日期 2011.06.06
申请人 LEE SANGHYUN;DUNGA MOHAN;HIGASHITANI MASAAKI;PHAM TUAN;KREUPL FRANZ 发明人 LEE SANGHYUN;DUNGA MOHAN;HIGASHITANI MASAAKI;PHAM TUAN;KREUPL FRANZ
分类号 G11C16/10;G11C16/04;H01L21/336;H01L29/788 主分类号 G11C16/10
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