发明名称 |
METHOD FOR PRODUCING SILICON LAYERS |
摘要 |
The invention relates to a liquid-phase method for the thermal production of silicon layers on a substrate, wherein at least one higher silicon that can be produced from at least one hydridosilane of the generic formula SiaH2a+2 (with a=3-10) being applied to a substrate and then being thermally converted to a layer that substantially consists of silicon, the thermal conversion of the higher silane proceeding at a temperature of 500-900° C. and a conversion time of ≦̸5 minutes. The invention also relates to silicon layers producible according to said method and to their use. |
申请公布号 |
EP2501841(A2) |
申请公布日期 |
2012.09.26 |
申请号 |
EP20100781639 |
申请日期 |
2010.11.10 |
申请人 |
EVONIK DEGUSSA GMBH |
发明人 |
WIEBER, STEPHAN;PATZ, MATTHIAS;CARIUS, REINHARD;BRONGER, TORSTEN;COELLE, MICHAEL |
分类号 |
C23C18/14;C08G77/60;C09D183/16;C23C18/12;H01L21/02 |
主分类号 |
C23C18/14 |
代理机构 |
|
代理人 |
|
主权项 |
|
地址 |
|