METHOD FOR PURIFICATION OF TRICHLOROSILANE

摘要

PURPOSE: A method for refining trichlorosilane is provided to efficiently obtain trichlorosilane of high purity required for the polysilicon of a semiconductor without a pipe clogging phenomenon. CONSTITUTION: A method for refining trichlorosilane includes the following: crude trichlorosilane successively passes through at least two distilling columns(C1 to C4); at least one bed containing moisture eliminated silica gel is installed between the distilling columns; and liquid trichlorosilane stream passes through the silica gel bed. Each operational pressure of the distilling columns is in a range between 1 and 5 kg/cm^2. Each operation temperature of the distilling columns is in a range between 50 and 150 deg C.