| 摘要 |
<p>PURPOSE: A method and apparatus for forming a coating layer and a storage medium are provided to control the thickness of the coating layer by controlling a relative moving speed of a substrate. CONSTITUTION: A nozzle outlet is connected to the upper side of a substrate by resist solutions(St3). The resist solutions are discharged from the nozzle outlet by an initial pressure value(St4). A substrate transfer speed is calculated to equalize the actual film thickness with a target film thickness(St5). A coating process is performed on the substrate and a transfer driving unit is controlled to transfer the substrate at the substrate transfer speed(St6). If the rear end of the transferred substrate approaches the lower side of the nozzle, the resist solutions from the nozzle outlet are not discharged(St10). A nozzle is lifted by a nozzle lifting unit(St11). [Reference numerals] (AA) Start; (BB) Finish; (St1) Setting a parameter like a film thickness target value; (St10) Stop at a coating finish position; (St11) Raising a nozzle; (St2) Transferring a substrate to a coating start position; (St3) Moving a nozzle down and coating resist solutions on a substrate; (St4) Transferring a substrate at a preset speed(initial value) and discharging resist solutions with preset pressure; (St5) Calculating and setting a substrate transfer speed V based on a film thickness estimation formula; (St6) Coating process; (St7) Time Ts elapse; (St8,St9) Coating finish?</p> |
