发明名称 Semiconductor device and method of manufacturing the same
摘要 A semiconductor device includes a substrate; an alignment mark formed on the substrate and composed of a metal film; a cover insulating film formed on the alignment mark and covering an entire surface of the alignment mark; and a polyimide film formed on the cover insulating film, and having an opening, which is opened on the alignment mark and has an end face aligning with an end face of the alignment mark, in plan view.
申请公布号 US8274166(B2) 申请公布日期 2012.09.25
申请号 US20090458278 申请日期 2009.07.07
申请人 SHIMADA HIROKAZU;RENESAS ELECTRONICS CORPORATION 发明人 SHIMADA HIROKAZU
分类号 H01L29/40 主分类号 H01L29/40
代理机构 代理人
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