发明名称 Pellicle for lithography and a method for making the same
摘要 There is provided a pellicle in which the frame is chamfered along all of its horizontal edges (as viewed when the pellicle frame is laid flat), and in particular those edges of the frame where the membrane-bonding frame face meets the external side walls of the frame are chamfered to the extent of C:0.01 mm-C:0.12 mm; in relation to this chamfer, a method is also provided wherein, after attaching a preformed pellicle membrane to the membrane-bonding frame face, the excessive part of the preformed membrane which extends beyond outer edges of the frame face is cut off in a manner wherein a blade of a knife is caused to scour the chamfer over the membrane in a manner such that the knife blade is kept in such an angle that the blade gets in a face-to-face contact with the chamfer face or that the blade touches only that edge of the frame where the chamfer face meets the first frame face while the knife blade is moved along the chamfered edge of the frame.
申请公布号 US8273507(B2) 申请公布日期 2012.09.25
申请号 US20100926481 申请日期 2010.11.22
申请人 NAGATA YOSHIHIKO;SHIN-ETSU CHEMICAL CO., LTD. 发明人 NAGATA YOSHIHIKO
分类号 G03F1/64;A47G1/12;G03F1/62 主分类号 G03F1/64
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