发明名称 |
Substrate surface inspection method and inspection apparatus |
摘要 |
A substrate surface inspection method inspects for a defect on a substrate including a plurality of materials on a surface thereof. The inspection method comprises: irradiating the surface of the substrate with an electron beam, a landing energy of the electron beam set such that a contrast between at least two types of materials of the plurality of materials is within a predetermined range; detecting electrons generated by the substrate to acquire a surface image of the substrate, with a pattern formed thereon from the at least two types of materials eliminated or weakened; and detecting the defect from the acquired surface image by detecting as the defect an object image having a contrast by which the object image can be distinguished from a background image in the surface image. Defects present on the substrate surface can be detected easily and precisely by using a cell inspection. |
申请公布号 |
US8274047(B2) |
申请公布日期 |
2012.09.25 |
申请号 |
US20090537414 |
申请日期 |
2009.08.07 |
申请人 |
NAITO YOSHIHIKO;KIMURA NORIO;TERAO KENJI;HATAKEYAMA MASAHIRO;ITOH MASAMITSU;EBARA CORPORATION;KABUSHIKI KAISHA TOSHIBA |
发明人 |
NAITO YOSHIHIKO;KIMURA NORIO;TERAO KENJI;HATAKEYAMA MASAHIRO;ITOH MASAMITSU |
分类号 |
G01N23/00;G01N23/225;G03F1/84;G03F1/86 |
主分类号 |
G01N23/00 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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