发明名称 Radiation-sensitive resin composition and compound
摘要 A radiation-sensitive resin composition includes a compound shown by a formula (1) in which R1 represents a divalent hydrocarbon group having 1 to 20 carbon atoms and R2 represents a hydrogen atom or a monovalent hydrocarbon group having 1 to 20 carbon atoms, or R1 and R2 form a heterocyclic structure having 4 to 20 carbon atoms, R3 represents a monovalent acid-dissociable group, n is an integer from 1 to 6, each of R4A, R4B, and R4C represents one of an alkyl group having 1 to 4 carbon atoms and a monovalent alicyclic hydrocarbon group having 4 to 20 carbon atoms, or R4A represents one of an alkyl group having 1 to 4 carbon atoms and a monovalent alicyclic hydrocarbon group having 4 to 20 carbon atoms and R4B and R4C form a divalent alicyclic hydrocarbon group having 4 to 20 carbon atoms.
申请公布号 US8273521(B2) 申请公布日期 2012.09.25
申请号 US20100846836 申请日期 2010.07.30
申请人 SATO MITSUO;NAKAHARA KAZUO;NAKASHIMA HIROMITSU;NAKANO TAKANORI;SUGIURA MAKOTO;JSR CORPORATION 发明人 SATO MITSUO;NAKAHARA KAZUO;NAKASHIMA HIROMITSU;NAKANO TAKANORI;SUGIURA MAKOTO
分类号 G03F7/00;G03F7/004;G03F7/028 主分类号 G03F7/00
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