发明名称 Substrate processing apparatus
摘要 A substrate processing apparatus includes first and second transfer chambers, first and second load lock chambers for exchanging one or more substrates with respective ones of first and the second transfer chambers, and a substrate transfer unit, located between the first and second load lock chambers, for transferring the one or more substrates to the first and second load lock chambers.
申请公布号 US8272826(B2) 申请公布日期 2012.09.25
申请号 US20080144680 申请日期 2008.06.24
申请人 JO CHEOL RAE;PARK JANG-WAN;JEONG WON KI;ADVANCED DISPLAY PROCESS ENGINEERING CO., LTD 发明人 JO CHEOL RAE;PARK JANG-WAN;JEONG WON KI
分类号 H01L21/677 主分类号 H01L21/677
代理机构 代理人
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