发明名称 Optical semiconductor device and method for manufacturing the same
摘要 There is provided an optical semiconductor device having a first optical semiconductor element including an InP substrate, a lower cladding layer formed on the InP substrate, a lower optical guide layer which is formed on the lower cladding layer and is composed of AlGaInAs, an active layer which is formed on the lower optical guide layer and has a multiple quantum well structure where a well layer and a barrier layer that is formed of AlGaInAs are alternately stacked, an upper optical guide layer which is formed on the active layer and is composed of InGaAsP, and an upper cladding layer formed on the upper optical guide layer.
申请公布号 US8273585(B2) 申请公布日期 2012.09.25
申请号 US201113314874 申请日期 2011.12.08
申请人 TAKADA KAN;YAMAMOTO TSUYOSHI;FUJITSU LIMITED 发明人 TAKADA KAN;YAMAMOTO TSUYOSHI
分类号 H01L33/58 主分类号 H01L33/58
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