发明名称 Copper filling-up method
摘要 A method of filling copper in a non-through hole on a substrate that has been treated to render it conductive, which comprises plating said substrate in an acidic copper plating bath comprising a water-soluble copper salt, sulfuric acid and a filling additive that is a polymer having the activities of both of a brightener and a leveler.
申请公布号 US8273232(B2) 申请公布日期 2012.09.25
申请号 US20100753530 申请日期 2010.04.02
申请人 OKAMOTO NAOKI;KONDO KAZUO;KURI HIDEYUKI;BUNYA MASARU;TAKEUCHI MINORU;OSAKA PREFECTURE UNIVERSITY PUBLIC CORPORATION;NITTO BOSEKI CO., LTD. 发明人 OKAMOTO NAOKI;KONDO KAZUO;KURI HIDEYUKI;BUNYA MASARU;TAKEUCHI MINORU
分类号 C25D5/02 主分类号 C25D5/02
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