| 摘要 |
PURPOSE: A method of operating a vacuum deposition apparatus is provided to prevent residues to be diffused inside a chamber by forming a diffusion barrier layer on the whole inner wall portion of a deposition chamber. CONSTITUTION: A chamber is washed with gas containing fluorine. Residues(13) exist within a wall portion of a deposition chamber(11). A diffusion barrier layer(15) is formed on the whole inner wall portion of the deposition chamber. The diffusion barrier layer prevents the residues to be diffused inside the chamber. The thickness of the diffusion barrier layer is determined according to layer material and deposition temperature. The thickness of the diffusion barrier layer is a range of 5nm to 500nm. A substrate(17) for manufacturing a solar cell is formed inside the deposition chamber.
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