| 摘要 |
PURPOSE: A processing chamber of a substrate processing device is provided to install a pin plate in an internal side of a chamber body, thereby preventing damage of a vacuum in the internal processing chamber. CONSTITUTION: A chamber body(100) is formed a space which a substrate is processed in an internal chamber body. The chamber body includes an upper wall, a side wall, and a lower wall. A lift pin(220) increases/decreases the substrate. The lift pin is fixed in a pin plate(240). The pin plate increases/decreases the lift pin. The lower wall has an auxiliary chamber(C2) which the pin plate is installed. The lower wall includes a main body having an opening side in a lower side and a cover connected to the opening side.
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