发明名称 |
ELECTRIC JOINT STRUCTURE, AND METHOD FOR PREPARING THE SAME |
摘要 |
<p>PURPOSE: An electric connection terminal structure and a manufacturing method thereof are provided to improve shock resistance by suppressing a P-enriched layer and a Ni-Sn based intermetallic compound in a solder junction interface. CONSTITUTION: A non-electrolytic surface process plating layer including nickel is formed on a connection terminal. A solder layer(120) is formed on the non-electrolytic surface process plating layer. An intermetallic compound(150) is generated from the non-electrolytic surface process plating layer. The non-electrolytic surface process plating layer includes a nickel plating film of 0.02 to 1 um. The intermetallic compound is made of Cu-Sn-Pd-Ni.</p> |
申请公布号 |
KR101184875(B1) |
申请公布日期 |
2012.09.20 |
申请号 |
KR20110062947 |
申请日期 |
2011.06.28 |
申请人 |
SAMSUNG ELECTRO-MECHANICS CO., LTD. |
发明人 |
LEE, DONG JUN;KIM, JUNG SUK |
分类号 |
H05K3/34;C23C18/50;H01L21/60;H05K3/18 |
主分类号 |
H05K3/34 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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