发明名称 ELECTRIC JOINT STRUCTURE, AND METHOD FOR PREPARING THE SAME
摘要 <p>PURPOSE: An electric connection terminal structure and a manufacturing method thereof are provided to improve shock resistance by suppressing a P-enriched layer and a Ni-Sn based intermetallic compound in a solder junction interface. CONSTITUTION: A non-electrolytic surface process plating layer including nickel is formed on a connection terminal. A solder layer(120) is formed on the non-electrolytic surface process plating layer. An intermetallic compound(150) is generated from the non-electrolytic surface process plating layer. The non-electrolytic surface process plating layer includes a nickel plating film of 0.02 to 1 um. The intermetallic compound is made of Cu-Sn-Pd-Ni.</p>
申请公布号 KR101184875(B1) 申请公布日期 2012.09.20
申请号 KR20110062947 申请日期 2011.06.28
申请人 SAMSUNG ELECTRO-MECHANICS CO., LTD. 发明人 LEE, DONG JUN;KIM, JUNG SUK
分类号 H05K3/34;C23C18/50;H01L21/60;H05K3/18 主分类号 H05K3/34
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