| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide an actinic ray-sensitive or radiation-sensitive resin composition capable of achieving both line edge roughness and sensitivity and an actinic ray-sensitive or radiation-sensitive film using the same and a pattern formation method. <P>SOLUTION: There is provided an actinic ray-sensitive or radiation-sensitive resin composition containing a resin having an acid-decomposable repeating unit represented by the general formula (I) and a compound generating acid by irradiation of active light or radiant ray (wherein, R<SB POS="POST">1</SB>represents a hydrogen atom, an alkyl group, a halogen atom, a cyano group, or an alkyl oxy-carbonyl group. R<SB POS="POST">2</SB>represents an alkyl group or a cycloalkyl group. R<SB POS="POST">3</SB>represents a monovalent substituent. W represents an alkylene group or a cycloalkylene group. X represents an oxygen atom or a sulfur atom, and a ring including X represents a structure including an ether bond or a thioether group. l or n each independently represents an integer of 0 or more. When n is 2 or more, a plurality of R<SB POS="POST">3</SB>s are respectively independent and may be bonded together to form a ring.) <P>COPYRIGHT: (C)2012,JPO&INPIT |
