PATTERN FORMATION METHOD, ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, AND RESIST FILM

摘要

PROBLEM TO BE SOLVED: To provide a pattern formation method that allows excellent roughness performance such as line width roughness and exposure latitude, and an actinic ray-sensitive or radiation-sensitive resin composition and a resist film used for the same.

SOLUTION: A pattern formation method comprises: (A) a step of forming a film using an actinic ray-sensitive or radiation-sensitive resin composition including a resin containing repeating units consisting of 65 mol% or more repeating units including a group that is decomposed by the action of acid to generate a polar group, with respect to the repeating units in the resin as a whole, and expressed by a following general formula (I) or (II); (B) a step of exposing the film; and (C) a step of developing an image using a developing solution including an organic solvent.

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