| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a reflective mask and an exposure device which prevent the deterioration of a joining surface and foreign objects which are caused by joining a conductive film formed on a rear surface of the reflective mask with an electrostatic chuck for fixing the mask. <P>SOLUTION: An EUV mask 12 is formed by forming a multilayer reflection film reflecting EUV light and an absorption film on a base material and evenly applying a conductive film and a protection coat to a rear surface of the base material. The EUV mask 12 is absorbed by a mask stage 13 of the EUV exposure device. The EUV mask 12 and the electrostatic chuck in the exposure device are in contact with each other through the protection coat having a basic skeleton formed by carbon atoms, thereby preventing the surface deterioration of the rear surface of the EUV mask and the electrostatic chuck and the occurrence and the adhesion of foreign objects. At the same time, foreign objects remaining on the electrostatic chuck side are removed by radiating an energy line 18 from a light source for cleaning 17 in the device. <P>COPYRIGHT: (C)2012,JPO&INPIT |
