Operating a vacuum coating system for producing thin film solar cells, comprises purifying a coating chamber using a cleaning gas, and depositing a diffusion barrier layer comprising amorphous silicon carbide on coating chamber walls

摘要

The method comprises purifying a coating chamber (11) using a fluorine-containing cleaning gas, and depositing a diffusion barrier layer (15) comprising amorphous silicon carbide on walls of the chamber and manufacturing a product. A thickness of the diffusion barrier layer is adjusted to 50-300 nm depending on a coating material and a deposition temperature such that the barrier layer remains stable on the wall of the chamber during the operation of a vacuum coating system. The deposition step includes deposition of an n-doped or p-doped or intrinsic silicon layer of a thin film solar cell.