PHOTOSENSITIVE CONDUCTIVE PASTE AND METHOD OF MANUFACTURING CONDUCTIVE PATTERN

摘要

Provided is a photosensitive conductive paste making it possible to achieve conductive patterns with low specific resistance under low-temperature conditions; also provided is a method of manufacturing a conductive pattern created using said photosensitive conductive paste. This photosensitive conductive paste contains (A) a compound having a carboxylic acid, or an acid anhydride thereof, (B) a photosensitive component having an unsaturated double bond and an acid value of 40-200 mgKOH/g, (C) a photopolymerization initiator, and (D) a conductive filler. This method of manufacturing a conductive pattern involves said photosensitive conductive paste being coated on the substrate, dried, exposed, developed, and then cured at a temperature of 100°C to 300°C.