| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a pattern generation method and an apparatus for reducing a correction residual in loading effect correction. <P>SOLUTION: A pattern generation method, in one aspect of the present invention, for forming a pattern on a sample 10, comprises: changing a dimension of a design pattern 12 by using an area S of the pattern included in each mesh-like region and a total sum of length of outer circumferential sides of the pattern in a pattern forming region of the sample 10 which is virtually divided into a plurality of the mesh-like regions; and correcting a dimension error of the pattern caused by loading effects. By the present invention, a correction residual in the loading effect correction can be reduced. <P>COPYRIGHT: (C)2012,JPO&INPIT |
