| 摘要 |
The disclosed method includes: calculating a first expected value of the number of failures for each combination of a feature that is a failure factor and a first group regarding classification elements of first semiconductor devices for which a failure is analyzed and second semiconductors on which a same circuit as the first semiconductors is implemented, from first data for each first group and a predetermined expression, wherein the first data includes the number of actual failures occurred in the first group and first feature values of features; and calculating, for each feature, a first indicator value representing similarity between a distribution of the first expected values over the first groups and a distribution of the numbers of actual failures over the first groups, from the first expected value for each combination of the feature and the first group and the number of actual failures for each first group.
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