发明名称 SEMICONDUCTOR DEVICE AND METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE
摘要 <P>PROBLEM TO BE SOLVED: To manufacture a semiconductor device with high precision and, in particular, to provide and manufacture a solid-state imaging device with high image quality. <P>SOLUTION: In an imaging region 103 and a peripheral region 104 of a semiconductor substrate 101, a first waveguide member 118 and a via plug penetrating through the first waveguide member 118 are provided. <P>COPYRIGHT: (C)2012,JPO&INPIT
申请公布号 JP2012182429(A) 申请公布日期 2012.09.20
申请号 JP20110223299 申请日期 2011.10.07
申请人 CANON INC 发明人 SAWADA YOSHIHARU;SUZUKI SHO;USUI TAKASHI;IWATA JUNJI;OKABE TAKESHI;ITABASHI MASAJI
分类号 H01L27/14;H01L27/146;H04N5/369 主分类号 H01L27/14
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