发明名称 |
MANUFACTURING METHOD OF PROTECTION FILM LAMINATE AND POLARIZER PLATE, AND PROTECTION FILM LAMINATE AND POLARIZER PLATE MANUFACTURED BY THE METHOD |
摘要 |
<P>PROBLEM TO BE SOLVED: To provide a manufacturing method of a protection film laminate and polarizer plate in which slit chips and unevenness of cut face are hard to occur when slitting, and a protection film laminate and polarizer plate manufactured by the method. <P>SOLUTION: There is provided the manufacturing method of a protection film laminate 24 in which a protection film 26 is laminated on a surface of a base film 25 so as to be separated. The manufacturing method includes a laminating step 5 of producing a laminate Lf of a base film Bf and a protection film 26 by laminating the protection film 26 on the surface of the base film 25, and a slitting step 6 of slitting a side end of the laminate Lf with a prescribed slit width Ws. In the laminating step 5, a protection film 26 in which a ratio between a width WPf of the protection film before slitting and the slit width Ws exceeds 1.00 is laminated on the base film 25. <P>COPYRIGHT: (C)2012,JPO&INPIT |
申请公布号 |
JP2012181276(A) |
申请公布日期 |
2012.09.20 |
申请号 |
JP20110043138 |
申请日期 |
2011.02.28 |
申请人 |
SUMITOMO CHEMICAL CO LTD |
发明人 |
SHIRAISHI TAKASHI;ISHIDA HIROSHI;HAYASHI HIDEKI;ICHIHARA MASAHIRO |
分类号 |
G02B5/30;B32B27/00;G02F1/1335 |
主分类号 |
G02B5/30 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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