COATING, AND METHOD AND DEVICE FOR COATING

摘要

The invention relates to a method and a device for applying a coating to a substrate (20), wherein a plasma jet (2) of a low-temperature plasma is produced by conducting a working gas (3) through an excitation zone. The plasma jet is directed at the substrate (20), and plate-shaped particles (10) having an average thickness (H) between 10 and 50,000 nanometers and a shape factor (F) in a value range from 10 to 2000 are fed into the plasma jet (2). The plate-shaped particles are fed into the plasma jet (2) by means of a carrier gas (14). The plasma jet (2) is produced by exciting the working gas (3) by means of an alternating voltage or a pulsed direct voltage.