发明名称 |
SUBSTRATE CLEANING METHOD AND SUBSTRATE CLEANING APPARATUS |
摘要 |
A substrate cleaning method that includes: a step in which, while a substrate holder is being continuously rotated, a to-be-discharged position of the cleaning liquid on the substrate is changed to an eccentric position deviated from the central part of the substrate, and a gas is discharged from a gas nozzle to the central part of the substrate so as to form a dried area of the cleaning liquid under a condition in which a shortest distance between an edge of a cleaning liquid flow output from the cleaning-liquid nozzle and an edge of a gas flow output from the gas nozzle is set between 9 mm and 15 mm.
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申请公布号 |
US2012234362(A1) |
申请公布日期 |
2012.09.20 |
申请号 |
US201213486084 |
申请日期 |
2012.06.01 |
申请人 |
YOSHIHARA KOUSUKE;YOSHIDA YUICHI;YAMAMOTO TARO;TOKYO ELECTRON LIMITED |
发明人 |
YOSHIHARA KOUSUKE;YOSHIDA YUICHI;YAMAMOTO TARO |
分类号 |
B08B7/04;B08B3/02;B08B5/02 |
主分类号 |
B08B7/04 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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