发明名称 LASER SCRIBING WITH EXTENDED DEPTH AFFECTATION INTO A WORKPLACE
摘要 Systems and methods for laser scribing provide extended depth affectation into a substrate or workpiece by focusing a laser beam such that the beam passes into the workpiece using a waveguide, self-focusing effect to cause internal crystal damage along a channel extending into the workpiece. Different optical effects may be used to facilitate the waveguide, self-focusing effect, such as multi-photon absorption in the material of the workpiece, transparency of the material of the workpiece, and aberrations of the focused laser. The laser beam may have a wavelength, pulse duration, and pulse energy, for example, to provide transmission through the material and multi-photon absorption in the material. An aberrated, focused laser beam may also be used to provide a longitudinal spherical aberration range sufficient to extend the effective depth of field (DOF) into the workpiece.
申请公布号 US2012234807(A1) 申请公布日期 2012.09.20
申请号 US201213422190 申请日期 2012.03.16
申请人 SERCEL JEFFREY P.;MENDES MARCO;HANNON MATHEW;VON DADELSZEN MICHAEL;J.P. SERCEL ASSOCIATES INC. 发明人 SERCEL JEFFREY P.;MENDES MARCO;HANNON MATHEW;VON DADELSZEN MICHAEL
分类号 B23K26/38 主分类号 B23K26/38
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