发明名称 |
GAS MANIFOLD, MODULE FOR LITHOGRAPHIC APPARATUS, LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD |
摘要 |
<P>PROBLEM TO BE SOLVED: To provide a gas manifold in which measures are taken to stabilize a gas flow provided between at least two parallel plates of an optical component of a lithographic apparatus. <P>SOLUTION: A gas manifold to direct a gas flow between two parallel plates of an optical component of a lithographic apparatus has: an inlet to provide a gas flow to the gas manifold; a lattice comprising a plurality of through holes in a regular periodic structure to homogenize the gas flow; a contractor downstream of the lattice to reduce the cross sectional area through which the gas flow flows; and an outlet downstream of the contractor to provide the gas flow to the two parallel plates. <P>COPYRIGHT: (C)2012,JPO&INPIT |
申请公布号 |
JP2012182451(A) |
申请公布日期 |
2012.09.20 |
申请号 |
JP20120036445 |
申请日期 |
2012.02.22 |
申请人 |
ASML NETHERLANDS BV |
发明人 |
VAN BOXTEL FRANK JOHANNES JACOBUS;PETER DE BRAUWER;VAN DER STEEN ANTONIUS ARNOLDUS HENRICUS;ROBIN BERNARDUS JOHANNES KOLDEWEIJ |
分类号 |
H01L21/027;G03F7/20 |
主分类号 |
H01L21/027 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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