发明名称 GAS MANIFOLD, MODULE FOR LITHOGRAPHIC APPARATUS, LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD
摘要 <P>PROBLEM TO BE SOLVED: To provide a gas manifold in which measures are taken to stabilize a gas flow provided between at least two parallel plates of an optical component of a lithographic apparatus. <P>SOLUTION: A gas manifold to direct a gas flow between two parallel plates of an optical component of a lithographic apparatus has: an inlet to provide a gas flow to the gas manifold; a lattice comprising a plurality of through holes in a regular periodic structure to homogenize the gas flow; a contractor downstream of the lattice to reduce the cross sectional area through which the gas flow flows; and an outlet downstream of the contractor to provide the gas flow to the two parallel plates. <P>COPYRIGHT: (C)2012,JPO&INPIT
申请公布号 JP2012182451(A) 申请公布日期 2012.09.20
申请号 JP20120036445 申请日期 2012.02.22
申请人 ASML NETHERLANDS BV 发明人 VAN BOXTEL FRANK JOHANNES JACOBUS;PETER DE BRAUWER;VAN DER STEEN ANTONIUS ARNOLDUS HENRICUS;ROBIN BERNARDUS JOHANNES KOLDEWEIJ
分类号 H01L21/027;G03F7/20 主分类号 H01L21/027
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