发明名称 INTEGRATED METROLOGY FOR WAFER SCREENING
摘要 Integrated wafer or substrate bow measurement modules are described. For example, a multi-chamber system includes a chamber housing a bow measurement module. In another example, a method of pre-screening a wafer includes inserting a wafer or a substrate into a multi-chamber system. A bow parameter of the wafer or the substrate is measured in a bow measurement module housed in a chamber of the multi-chamber system.
申请公布号 US2012234238(A1) 申请公布日期 2012.09.20
申请号 US201213419121 申请日期 2012.03.13
申请人 HSU WEI-YUNG;CHUNG HUA;SHIU TING-RUEI;CUI JIE 发明人 HSU WEI-YUNG;CHUNG HUA;SHIU TING-RUEI;CUI JIE
分类号 C23C16/52;G01N3/00 主分类号 C23C16/52
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