发明名称 |
INTEGRATED METROLOGY FOR WAFER SCREENING |
摘要 |
Integrated wafer or substrate bow measurement modules are described. For example, a multi-chamber system includes a chamber housing a bow measurement module. In another example, a method of pre-screening a wafer includes inserting a wafer or a substrate into a multi-chamber system. A bow parameter of the wafer or the substrate is measured in a bow measurement module housed in a chamber of the multi-chamber system. |
申请公布号 |
US2012234238(A1) |
申请公布日期 |
2012.09.20 |
申请号 |
US201213419121 |
申请日期 |
2012.03.13 |
申请人 |
HSU WEI-YUNG;CHUNG HUA;SHIU TING-RUEI;CUI JIE |
发明人 |
HSU WEI-YUNG;CHUNG HUA;SHIU TING-RUEI;CUI JIE |
分类号 |
C23C16/52;G01N3/00 |
主分类号 |
C23C16/52 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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