发明名称 FILM-LIKE WAFER MOLD MATERIAL, MOLDED WAFER, AND SEMICONDUCTOR DEVICE
摘要 A film-like wafer mold material for molding a wafer in a lump, the material including a multilayer structure constituted of at least a first film layer and a second film layer provided on the first film layer, wherein the first film layer contains a silicone-backbone-containing polymer, a cross-linking agent, and a filler, and the second film layer, contains a silicone-backbone-containing polymer and a cross-linking agent, and further contains a filler in such a manner that a content rate of the filler becomes 0 or above and less than 100 when a content rate of the filler contained in the first film layer is assumed to be 100. The film-like wafer mold material has excellent transference performance with respect to a thin-film wafer with a large diameter, also has low-warp properties and excellent wafer protection performance after form shaping (after molding), and is preferably used for a wafer level package.
申请公布号 US2012235284(A1) 申请公布日期 2012.09.20
申请号 US201213410887 申请日期 2012.03.02
申请人 SUGO MICHIHIRO;KONDO KAZUNORI;SHIN-ETSU CHEMICAL CO., LTD. 发明人 SUGO MICHIHIRO;KONDO KAZUNORI
分类号 H01L23/00;B32B9/04;B32B27/38 主分类号 H01L23/00
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