METHOD OF CONTROLLING A LITHOGRAPHIC APPARATUS, DEVICE MANUFACTURING METHOD, LITHOGRAPHIC APPARATUS, COMPUTER PROGRAM PRODUCT AND METHOD OF IMPROVING A MATHEMATICAL MODEL OF A LITHOGRAPHIC PROCESS

摘要

PURPOSE: A method for controlling a lithography device, a method for manufacturing a device, the lithography device, a computer program product and a method for improving a mathematical model of a lithographic process are provided to predict an effect of imaging conditions for features or feature parameters by using a model. CONSTITUTION: A lighting system is set for inducing a selected lighting mode(S2). A first parameter value of a device is measured(S4). The measured first parameter value, and a second parameter value of a reflected image of a task feature of a test pattern including a plurality of features by using a model of the lithography device are calculated(S5). The lithography device is controlled with the calculated second parameter value(S6).