发明名称 |
IMAGE PROCESSING-BASED LITHOGRAPHY SYSTEM AND METHOD OF COATING TARGET OBJECT |
摘要 |
A technique related with a lithography system is disclosed. The lithography system includes at least one target object disposed on a substrate, a processor configured to process an image of the target object to determine an optical pattern for a coating layer of the target object, and an exposure apparatus configured to provide light having the optical pattern determined by the processor to the substrate. |
申请公布号 |
US2012236278(A1) |
申请公布日期 |
2012.09.20 |
申请号 |
US201213433938 |
申请日期 |
2012.03.29 |
申请人 |
KWON SUNG HOON;CHUNG SUEUN;LEE SEUNGAH;JANG JISUNG;HAN SANGKWON;SNU R&DB FOUNDATION |
发明人 |
KWON SUNG HOON;CHUNG SUEUN;LEE SEUNGAH;JANG JISUNG;HAN SANGKWON |
分类号 |
G03B27/42;G03F7/004;G03F7/20 |
主分类号 |
G03B27/42 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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