发明名称 SEMICONDUCTOR DEVICE HAVING DRIFT REGION AND DRIFT CONTROL REGION
摘要 <P>PROBLEM TO BE SOLVED: To provide a power semiconductor device having a drift path or a drift region with low on-resistance. <P>SOLUTION: A semiconductor device comprises: a drift region 2 of a first conductivity type in a semiconductor base material; a drift control region 3 that is disposed adjacent to the drift region 2 in the semiconductor base material and is composed of a semiconductor material; an accumulation dielectric 4 disposed between the drift region 2 and the drift control region 3; a base-material region 8; a drain region 5 that is isolated from the base-material region 8 and is adjacent to the accumulation dielectric 4; a source region 9 isolated from the drift region 2 by the base-material region 8; a gate electrode 15 insulated from the semiconductor base material by a gate dielectric 16, and extending from the source region 9 to the drift region 2 adjacently to the base-material region 8; a drain electrode 11 contacting the drain region 5; and a semiconductor region 27 complementarily doped to the drain region 5. The semiconductor region 27 is disposed between the drain electrode 11 and the drift region 2 and is adjacent to the drain electrode 11. <P>COPYRIGHT: (C)2012,JPO&INPIT
申请公布号 JP2012182463(A) 申请公布日期 2012.09.20
申请号 JP20120085846 申请日期 2012.04.04
申请人 INFINEON TECHNOLOGIES AUSTRIA AG 发明人 FRANK FIRSCH;ANTON MAUDER;HANS-JOACHIM SCHULZE;STEFAN SEDLMAIER;ARMIN WILLMEROTH;ZUNDEL MARKUS;HIRLER FRANZ;MITTAL ALLUNYAI
分类号 H01L29/78;H01L21/336;H01L27/04;H01L29/06;H01L29/47;H01L29/739;H01L29/872 主分类号 H01L29/78
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