Method for operating lighting device of microlithographic projection exposure system utilized for manufacturing e.g. LCD, involves carrying out illumination of area of optical element with short duration than illumination of another area

摘要

The method involves varying lighting of an optical element (14) i.e. honeycomb capacitor (12), of a lighting device (11) with illuminating light by using pointing-adjustment, where speed of the variation of the lighting is increased continuously with respect to time. An area of the optical element is illuminated after illuminating another area of the optical element. The illumination of the former area is carried out with short duration than the illumination of the latter area, where the optical element is provided with grid elements arranged on top of each other. An independent claim is also included for a microlithographic projection exposure system comprising a lighting device.