发明名称 |
USE OF BEAM SCANNING TO IMPROVE UNIFORMITY AND PRODUCTIVITY OF A 2D MECHANICAL SCAN IMPLANTATION SYSTEM |
摘要 |
An ion implantation system includes a beamline configured to direct an ion beam toward an end station configured to hold or support a workpiece, and a scanning system. The scanning system is configured to scan the end station past the ion beam in a two-dimensional fashion comprising a first scan axis along a first direction and a second scan axis along a second direction that is different than the first direction. The system further includes a supplemental scanning component operably associated with the scanning system, and configured to effectuate a scanning of the ion beam with respect to the end station along a third scan axis having a third direction that is different than the first direction. |
申请公布号 |
KR20120104152(A) |
申请公布日期 |
2012.09.20 |
申请号 |
KR20127002862 |
申请日期 |
2010.07.01 |
申请人 |
AXCELIS TECHNOLOGIES, INC. |
发明人 |
RAY ANDY |
分类号 |
H01J37/317;H01J37/147;H01J37/20 |
主分类号 |
H01J37/317 |
代理机构 |
|
代理人 |
|
主权项 |
|
地址 |
|