发明名称 |
METHOD OF MANUFACTURING LIGHT EMITTING DIODE |
摘要 |
PURPOSE: A light emitting diode manufacturing method is provided to decrease an operating voltage of an element by reducing ohmic resistance between a P type semiconductor layer and a P electrode. CONSTITUTION: A substrate including an N type semiconductor layer and an active layer is provided(S110). A P type semiconductor layer is formed by supplying nitrogen gas, gallium gas, and magnesium gas while maintaining a first temperature of the substrate(S120). The supply of the gallium gas is stopped and an Mg(magnesium) layer is formed on the P type semiconductor layer while cooling the first temperature of the substrate to a second temperature(S130). Mg of the Mg layer is spread on the P type semiconductor layer to form a high-concentration doping semiconductor layer(S140). [Reference numerals] (S110) Providing a substrate; (S120) Forming a P-type semiconductor layer; (S130) Forming an Mg layer on the P-type semiconductor layer; (S140) Forming a high-concentration doping semiconductor layer; (S150) Forming an N pad, a P electrode, and a P pad
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申请公布号 |
KR20120103817(A) |
申请公布日期 |
2012.09.20 |
申请号 |
KR20110021668 |
申请日期 |
2011.03.11 |
申请人 |
SEOUL OPTO DEVICE CO., LTD. |
发明人 |
YUN, JUN HO;YOO, HONG JAE;PARK, JAE HO |
分类号 |
H01L33/30 |
主分类号 |
H01L33/30 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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