发明名称
摘要 <P>PROBLEM TO BE SOLVED: To provide a plasma processing device in which the duration of plasma generated between electrodes is made long and the distance of plasma that can be reached is made long, thereby the height difference of concavo-convex on the surface of the treating object is made large. <P>SOLUTION: The indirect type plasma processing device 1 is provided with a pair of electrodes 3a, 3b, a power source 6 which supplies a prescribed power between the electrodes, a treating gas supply device 5 which supplies a treating gas 4 between the electrodes, and an ultraviolet light source 7 which irradiates ultraviolet light on a plasma fluid 9 which is generated between the electrodes and injected to the treating object 10. Even if radicals in the plasma are bonded and changed into other substance, the ultraviolet light is irradiated on the changed substance, and they are again separated into the radicals by the energy of ultraviolet light irradiated, thereby, the time (duration) until plasma is extinguished becomes long and the reaching distance of the plasma becomes long. <P>COPYRIGHT: (C)2010,JPO&INPIT
申请公布号 JP5031634(B2) 申请公布日期 2012.09.19
申请号 JP20080081854 申请日期 2008.03.26
申请人 发明人
分类号 H05H1/24;H01L21/3065 主分类号 H05H1/24
代理机构 代理人
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