发明名称 METHOD FOR MANUFACTURING SEMICONDUCTOR DEVICE
摘要 To provide a method for manufacturing a semiconductor device having a heat-resistant resin film with flip-chip connection structure using a solder bump or a gold bump and an epoxy resin compound laminated thereon, in which adhesiveness is improved particularly after exposure to high temperature and high humidity environments for a long period of time, thereby enhancing the reliability of the semiconductor device. The method for manufacturing a semiconductor device having a heat-resistant resin film formed on a semiconductor element and an epoxy resin compound layer laminated thereon, comprises carrying out a plasma treatment on a surface of the heat-resistant resin film on which the epoxy resin compound layer is laminated using a nitrogen atom-containing gas containing at least one of nitrogen, ammonia, and hydrazine.
申请公布号 EP1918987(A4) 申请公布日期 2012.09.19
申请号 EP20060796608 申请日期 2006.08.22
申请人 HITACHI CHEMICAL DUPONT MICROSYSTEMS LTD. 发明人 KOJIMA, YASUNORI;ITABASHI, TOSHIAKI
分类号 H01L21/56;H01L21/02;H01L21/312;H01L23/31 主分类号 H01L21/56
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