发明名称 Substrate holder for a vapour deposition system
摘要 <p>The invention relates to a partially disposable substrate holder used in magnetic latches for securing substrates on a planetary rotating platform suspended above a coating source in a vacuum chamber of a vapor deposition system, e.g. a chemical vapor deposition (CVD) system or a physical vapor deposition (PVD) system. The substrate holder includes a reusable base formed, at least partially, from a ferro-magnetic material, which is attracted to the magnetic latch, and a disposable cover formed from a relatively inexpensive, ferromagnetic, easily formable material, which encourages adherence of coating material and has a low vapor pressure at coating temperatures.</p>
申请公布号 EP1630261(B1) 申请公布日期 2012.09.19
申请号 EP20050255095 申请日期 2005.08.17
申请人 JDS UNIPHASE CORPORATION 发明人 SEDDON, RICHARD I.
分类号 C30B25/12;C23C14/50;C23C16/44;C23C16/458;C30B31/14;H01F7/02;H01L21/687 主分类号 C30B25/12
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