发明名称 SEMICONDUCTOR DEVICE AND METHOD FOR MANUFACTURING THE SAME
摘要 <p>PURPOSE: A semiconductor device and a manufacturing method thereof are provided to control a trade-off property of recovery loss and an on-voltage by controlling the on-voltage through the impurity concentration of a P type anode layer. CONSTITUTION: An N type drift layer(1) is provided. A P type anode layer(2) is installed on the N type drift layer. A trench(3) penetrates the P type anode layer. A conductive substance(5) is embedded in the trench as an insulator film intervenes. An N type buffer layer(6) is installed between the N type drift layer and the P type anode layer and has higher impurity concentration than the N type drift layer's.</p>
申请公布号 KR20120103459(A) 申请公布日期 2012.09.19
申请号 KR20120022160 申请日期 2012.03.05
申请人 MITSUBISHI ELECTRIC CORPORATION 发明人 NISHII AKITO;NAKAMURA KATSUMI
分类号 H01L29/861;H01L21/328 主分类号 H01L29/861
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