发明名称 |
SEMICONDUCTOR DEVICE AND METHOD FOR MANUFACTURING THE SAME |
摘要 |
<p>PURPOSE: A semiconductor device and a manufacturing method thereof are provided to control a trade-off property of recovery loss and an on-voltage by controlling the on-voltage through the impurity concentration of a P type anode layer. CONSTITUTION: An N type drift layer(1) is provided. A P type anode layer(2) is installed on the N type drift layer. A trench(3) penetrates the P type anode layer. A conductive substance(5) is embedded in the trench as an insulator film intervenes. An N type buffer layer(6) is installed between the N type drift layer and the P type anode layer and has higher impurity concentration than the N type drift layer's.</p> |
申请公布号 |
KR20120103459(A) |
申请公布日期 |
2012.09.19 |
申请号 |
KR20120022160 |
申请日期 |
2012.03.05 |
申请人 |
MITSUBISHI ELECTRIC CORPORATION |
发明人 |
NISHII AKITO;NAKAMURA KATSUMI |
分类号 |
H01L29/861;H01L21/328 |
主分类号 |
H01L29/861 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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